Apparatus and methods for photomask backside cleaning
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United States of America Patent
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Jan 9, 2018
Issued Date -
N/A
app pub date -
Nov 18, 2015
filing date -
Nov 18, 2015
priority date (Note) -
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Abstract
Apparatus for cleaning a photo mask includes a rotor in a head, with the rotor having a seal plate having a central opening, a resilient mask seal in the central opening, and retractors attached to the resilient mask seal and adapted to move the resilient mask seal into open and closed positions. A motor in the head rotates the rotor. A push plate in the head moves to operate the retractors. In the closed position the resilient mask seal seals against the sides of the photo mask. The back side of the photo mask can then be cleaned without affecting the patterned front side of the photo mask.
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