Sensor system for lithography
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United States of America Patent
Stats
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Jan 9, 2018
Issued Date -
N/A
app pub date -
Apr 12, 2017
filing date -
Oct 17, 2012
priority date (Note) -
In Force
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Abstract
A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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ASML NETHERLANDS B V | 5500 AH VELDHOVEN |
International Classification(s)
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
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Kok, Haico Victor | Veldhoven, NL | 38 | 252 |
# of filed Patents : 38 Total Citations : 252 | |||
Voogd, Robbert Jan | Neerpelt, BE | 17 | 162 |
# of filed Patents : 17 Total Citations : 162 |
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Jul 19, 2017 | STCF | INFORMATION ON STATUS: PATENT GRANT | free format text: PATENTED CASE |
Aug 06, 2015 | P | Published | |
Apr 17, 2015 | F | Filing | |
Jun 11, 2009 | PD | Priority Date |

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