Sensor system for lithography

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United States of America Patent

PATENT NO 9864282
SERIAL NO

15486077

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Abstract

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A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B V5500 AH VELDHOVEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kok, Haico Victor Veldhoven, NL 38 252
Voogd, Robbert Jan Neerpelt, BE 17 162

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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges2979287828733321101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 1000501001502002503003504004505005506006507007508008509009501000

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