Photomask blank
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United States of America Patent
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Jan 9, 2018
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app pub date -
Aug 17, 2016
filing date -
Sep 3, 2015
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Abstract
A photomask blank comprising a transparent substrate and a chromium-containing film is provided. The chromium-containing film is formed of a chromium compound containing Cr, N, and optionally O, has a total Cr+N+O content≧93 at %, and meets the formula: 3Cr≧2O+3N. A chromium compound layer meeting a first composition having a N/Cr atomic ratio≧0.95, a Cr content ≧40 at %, a Cr+N content≧80 at %, and an O content≧10 at % accounts for 10-70% of the overall thickness of the chromium-containing film.
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