Method for manufacturing holographic blazed grating
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United States of America Patent
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Jan 9, 2018
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app pub date -
Oct 15, 2012
filing date -
Oct 19, 2011
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Abstract
A method for fabricating a holographic blazed grating is provided. The method includes: coating a photoresist layer on a substrate; performing lithography on the photoresist layer to form a photoresist grating; performing vertical ion beam etching on the substrate by using the photoresist grating as a mask, to form a homogeneous grating by transferring a pattern of the photoresist grating onto the substrate; cleaning the substrate to remove remaining photoresist; performing tilted Ar ion beam scanning etching on the substrate by using the homogeneous grating as a mask, and etching different portions of the substrate by utilizing a obscuring effect of the homogeneous grating mask on the ion beam, to form a triangular groove shape of the blazed grating; and cleaning the substrate to obtain the holographic blazed grating.
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