Poly(thioaminal) probe based lithography
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United States of America Patent
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Jan 9, 2018
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app pub date -
Nov 30, 2015
filing date -
Nov 30, 2015
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Abstract
Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.
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