Substrate liquid processing apparatus and method, and computer-readable recording medium with substrate liquid processing program recorded therein

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United States of America Patent

PATENT NO 9862007
SERIAL NO

14666896

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Abstract

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Disclosed are a substrate liquid processing apparatus and method for performing a liquid processing on a substrate using a processing liquid, and a computer-readable recording medium with a substrate liquid processing program recorded therein. In the method, a first chemical liquid supply step is performed to supply a first chemical liquid from a first chemical liquid supply unit to a processing liquid storage unit, a first chemical liquid purifying step is performed to purify the first chemical liquid in a chemical liquid purifying unit, a second chemical liquid supply step is performed to supply a second chemical liquid from a second chemical liquid supply unit to the processing liquid storage unit, and a processing liquid supply step is performed to supply the processing liquid obtained by mixing the first and second chemical liquids from the processing liquid supply unit to substrate liquid processing units.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Maezono, Tomiyasu Kumamoto, JP 3 5
Mizota, Shogo Kumamoto, JP 8 48
Nagamatsu, Tatsuya Beaverton, US 6 22
Nonaka, Jun Kumamoto, JP 32 131
Saiki, Daisuke Kumamoto, JP 8 21
Tanaka, Koji Kumamoto, JP 376 3502
Yabuta, Takashi Hsin-chu, TW 16 131

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