Target supply apparatus, extreme ultraviolet light generating apparatus, and target supply method
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United States of America Patent
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Jan 2, 2018
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N/A
app pub date -
Jul 14, 2016
filing date -
Mar 25, 2014
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Abstract
A target supply apparatus configured to melt a target and supply a molten target into a chamber, the target generating extreme ultraviolet light when the target is irradiated with a laser beam in the chamber, may include: a pair of electrodes spaced from one another and configured to sandwich the target; and a power source configured to supply a current to a solid target sandwiched between the pair of electrodes via the pair of electrodes to melt the solid target to a core of the solid target.
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