X-ray laser microscopy sample analysis system and method

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United States of America Patent

PATENT NO 9859029
APP PUB NO 20170169910A1
SERIAL NO

15442670

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Abstract

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Improved system and method of X-ray laser microscopy that combines information obtained from both X-ray diffraction and X-ray imaging methods. At least one sample is placed in an ultra-cold, ultra-low pressure vacuum chamber, often using a sample administration device configured to present a plurality of samples. The sample is exposed to brief bursts of coherent X-ray illumination, often further concentrated using X-ray mirrors and pinhole collimation methods. Higher resolution data from the samples is obtained using hard X-ray lasers, such as free electron X-ray lasers, and X-ray diffraction methods. Lower resolution data from the same samples can be obtained using any of hard or soft X-ray laser sources, and X-ray imaging methods employing nanoscale etched zone plate technology. In some embodiments both diffraction and imaging data can be obtained simultaneously. Data from both sources are combined to create a more complete representation of the samples.

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Patent Owner(s)

Patent OwnerAddress
RISING STAR PATHWAY A CALIFORNIA CORPORATION21920 EATON PLACE CUPERTINO CA 95014

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jia, Allison Sihan Cupertino, US 1 3
Liu, Muzhi Shen Zhen, CN 1 3
Wang, Yuhao Tang Shan, CN 43 63
Xian, Zhuotong San Jose, US 3 8
You, Kevin Shaokang Palo Alto, US 1 3
Zhang, Jingyi Beijing, CN 28 231

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