Lithographic apparatus and device manufacturing method
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United States of America Patent
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Jan 2, 2018
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app pub date -
Mar 19, 2015
filing date -
Apr 17, 2014
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Abstract
A lithographic apparatus includes a reflector to redirect a radiation beam, e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system includes a non-compensating actuator device and a compensating actuator device to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.
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