Lithographic apparatus and device manufacturing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9857695
SERIAL NO

15250658

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Beckers, Marcel Eindhoven, NL 39 480
Donders, Sjoerd Nicolaas Lambertus 's-Hergotenbosch, NL 253 8312
Evers, Elmar Almelo, NL 8 54
Hoogendam, Christiaan Alexander Veldhoven, NL 205 9950
Jacobs, Johannes Henricus Wilhelmus Eindhoven, NL 100 1179
Kemper, Nicolaas Rudolf Eindhoven, NL 95 1664
Migchelbrink, Ferdy Amersfoort, NL 19 91
Ten, Kate Nicolaas Almkerk, NL 157 972

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Jul 2, 2025
11.5 Year Payment $7400.00 $3700.00 $1850.00 Jul 2, 2029
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00