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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
INTERNATIONAL BUSINESS MACHINES CORPORATION	NEW ORCHARD ROAD ARMONK NY 10504

International Classification(s)

• G06F:ELECTRIC DIGITAL DATA PROCESSING
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Inoue, Tadanobu	Tokyo, JP	52	610
Melville, David O	Yorktown Heights, US	24	162
Rosenbluth, Alan E	Yorktown Heights, US	84	1570
Sakamoto, Masaharu	Tokyo, JP	106	1417
Tian, Kehan	Hopewell Junction, US	58	224

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Jul 2, 2025
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Jul 2, 2029

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
January 02, 2018	US,9857676,B2   US9857676B2	GRANTED PATENT AS SECOND PUBLICATION
April 14, 2016	US,20160103389,A1   US20160103389A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 9857676

Method and program product for designing source and mask for lithography

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