Device to adjust gas concentration in fluids
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United States of America Patent
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Jan 2, 2018
Issued Date -
N/A
app pub date -
Nov 5, 2015
filing date -
Dec 2, 2011
priority date (Note) -
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Abstract
A device to adjust concentration of a first gas in a fluid to a target concentration (Cf) is provided. The device includes a container, having a first opening, the container is configured to receive a first volume (VL) of the fluid through the first opening. Wherein the fluid has an initial concentration (Ci) of the first gas and a second volume (VC) of the container is determined based on the initial concentration (Ci) of the first gas in the fluid, a target concentration (Cf) of the first gas in the fluid, a partition coefficient (φ) of the first gas, and the first volume (VL), and configured to adjust pressure in the container at a predetermined pressure of the first gas to adjust the first gas concentration in the fluid to the target concentration (Cf); wherein the second volume (VC) and the first volume (VL) are correlated by:
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