Image processing-based lithography system and method of coating target object
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United States of America Patent
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Jan 2, 2018
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N/A
app pub date -
Jan 28, 2016
filing date -
Sep 30, 2009
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Abstract
A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.
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