Wafer processing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9855734
SERIAL NO

14420450

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a method of treating a wafer in the state where the wafer is fixed on a support plate with an adhesive composition. Although the wafer is treated by a chemical, heating, or exothermic treatment, the method achieves sufficient adhesiveness during the step of treating a surface of the wafer and allows detachment of the support plate from the wafer without damaging the wafer or leaving the adhesive on the wafer after the wafer treating step. The method of treating a wafer of the present invention includes the steps of: fixing a wafer on a support plate via an adhesive composition containing a curable adhesive component to be crosslinked and cured by light irradiation or heating; crosslinking and curing the curable adhesive component by light irradiation or heating of the adhesive composition; treating a surface of the wafer fixed on the support plate by a chemical, heating, or exothermic treatment; and detaching the support plate from the treated wafer.

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Patent Owner(s)

Patent OwnerAddress
SEKISUI CHEMICAL CO LTDOSAKA

International Classification(s)

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  • 2013 Application Filing Year
  • C09J Class
  • 876 Applications Filed
  • 717 Patents Issued To-Date
  • 81.85 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2013201420152016201720182019202020212022202320240255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Asao, Takahiro Osaka, JP 17 144
Tonegawa, Toru Osaka, JP 4 10
Ueda, Kozo Osaka, JP 1 0
Yabuguchi, Hirohide Osaka, JP 1 0

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  • 0 Citation Count
  • C09J Class
  • 0 % this patent is cited more than
  • 7 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges478071101 - 1011 - 2021 - 3031 - 400510152025303540455055606570758085

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