Gas separation membrane with ladder-structured polysilsesquioxane and method for fabricating the same

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United States of America Patent

PATENT NO 9855532
SERIAL NO

14697363

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Abstract

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The present disclosure provides a gas separation membrane using a ladder-structured polysilsesquioxane in which organic functional groups are attached to a long siloxane chain and a method for fabricating the same. In accordance with the present disclosure, a free-standing ladder-structured polysilsesquioxane-based membrane with various functional groups can be fabricated for gas separations. The performance of the gas separation membrane can be controlled through a variety of combinations of the organic functional groups linked to the siloxane chain. In addition, by controlling the molecular structure of the gas separation membrane through mixing of the ladder-structured polysilsesquioxane with an amine compound or conventional glassy or rubbery polymers or through thermal/UV-curing, the permeability and selectivity of the gas separation membrane can be controlled selectively.

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Patent Owner(s)

Patent OwnerAddress
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY5 HWARANG-RO 14-GIL SEONGBUK-GU SEOUL 02792

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hwang, Seung Sang Seoul, KR 36 113
Lee, Albert Sung Soo Seoul, KR 8 36
Lee, Jong Suk Seoul, KR 70 229
Lee, Sanghyup Seoul, KR 36 443
Park, Sang Hee Seoul, KR 89 791
Park, Sunghwan Seoul, KR 16 34

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