Dipole ring magnet assisted microwave radial line slot antenna plasma processing method and apparatus
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United States of America Patent
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Dec 26, 2017
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app pub date -
Apr 1, 2016
filing date -
Apr 3, 2015
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Abstract
A method and apparatus is provided for obtaining a low average electron energy flux onto a substrate in a processing chamber. A processing chamber includes a substrate support therein for chemical processing. An energy source induced plasma, and ion propelling means, directs energetic plasma electrons toward the substrate support. A dipole ring magnet field is applied perpendicular to the direction of ion travel, to effectively prevent electrons above an acceptable maximum energy level from reaching the substrate holder. Rotation of the dipole magnetic field reduces electron non-uniformities.
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