Frequency tuning for pulsed radio frequency plasma processing
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United States of America Patent
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Dec 26, 2017
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app pub date -
Apr 27, 2017
filing date -
Jun 30, 2014
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Abstract
This disclosure describes systems, methods, and apparatus for pulsed RF power delivery to a plasma load for plasma processing of a substrate. In order to maximize power delivery, a calibration phase using a dummy substrate or no substrate in the chamber, is used to ascertain a preferred fixed initial RF frequency for each pulse. This fixed initial RF frequency is then used at the start of each pulse during a processing phase, where a real substrate is used and processed in the chamber.
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