Vacuum trap
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United States of America Patent
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Dec 19, 2017
Issued Date -
N/A
app pub date -
May 28, 2015
filing date -
Mar 21, 2012
priority date (Note) -
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Abstract
A vacuum trap, a plasma etch system using the vacuum trap and a method of cleaning the vacuum trap. The vacuum trap includes a baffle housing; and a removable baffle assembly disposed in the baffle housing, the baffle assembly comprising a set of baffle plates, the baffle plates spaced along a support rod from a first baffle plate to a last baffle plate, the baffle plates alternately disposed above and below the support rod and alternately disposed in an upper region and a lower region of the baffle housing.
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