Mask design based on sensitivities to changes in pattern spacing
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 19, 2017
Issued Date -
N/A
app pub date -
Sep 15, 2016
filing date -
Feb 18, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Loading Importance Indicators... 
Abstract
A layout of an integrated circuit design is provided and a plurality of multiple patterning decompositions is determined from the layout. Each decomposition of the plurality of multiple patterning decompositions includes patterns separated into masks. One or more files are generated that include sensitivities of pattern capacitances to changes in spacing between patterns due to mask shifts. Using the sensitivities and changes in spacing, respective worst-case performance values are determined for each decomposition. A mask set is selected based on the worst-case performance values.
First Claim
Other Claims data not available
Family
Loading Family data...
International Classification(s)
- 2016 Application Filing Year
- G06F Class
- 60255 Applications Filed
- 46180 Patents Issued To-Date
- 76.65 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G06F Class
- 0 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | Jun 19, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | Jun 19, 2029 |
