Photomask manufacturing method and photomask
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United States of America Patent
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Dec 19, 2017
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N/A
app pub date -
Sep 2, 2014
filing date -
Mar 14, 2014
priority date (Note) -
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Abstract
According to one embodiment, a photomask manufacturing method for patterning a multilayer film into a mask pattern in the multilayer film is provided. The photomask manufacturing method includes preparing a substrate including the multilayer film provided on the substrate, obtaining an amount of position variation before and after the multilayer film is patterned if a position of the mask pattern is deviated before and after patterning the multilayer film, forming the mask pattern at a position deviated by the amount of the position variation from a target position, if the multilayer film is patterned and a pattern of the multilayer film is formed at the target position, and patterning the multilayer film with the mask pattern.
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