Optical heat source with restricted wavelengths for process heating
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United States of America Patent
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Dec 12, 2017
Grant Date -
Feb 5, 2015
app pub date -
Jun 21, 2013
filing date -
Jun 21, 2013
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Abstract
A semiconductor manufacturing system or process, such as an ion implantation system, apparatus and method, including a component or step for heating a semiconductor workpiece are provided. An optical heat source emits light energy to heat the workpiece. The optical heat source is configured to provide minimal or reduced emission of non-visible wavelengths of light energy and emit light energy at a wavelength in a maximum energy light absorption range of the workpiece.
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