Method of forming a feature of a target material on a substrate
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United States of America Patent
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Dec 12, 2017
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app pub date -
Dec 14, 2016
filing date -
Dec 21, 2015
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Abstract
A method is provided for forming a feature of a target material on a substrate. The method including:
- forming a feature of a sacrificial material on the substrate; andforming the feature of the target material by a deposition process during which the feature of the sacrificial material is removed from the substrate by forming a volatile reaction product with a precursor of the deposition process, wherein the sacrificial material is replaced by the target material and the target material is selectively deposited on surface portions of the substrate, which portions were covered by the feature of the sacrificial material, to form the feature of the target material.
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