Photomasks for reducing thermal stress generated by heat
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United States of America Patent
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Dec 12, 2017
Issued Date -
N/A
app pub date -
Apr 28, 2017
filing date -
Feb 24, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A photomask includes a light transmission substrate having a transfer region and a frame region, a light-transmitting region exposing a portion of the light transmission substrate in the transfer region corresponding to a transfer pattern, a phase shift region surrounding the light-transmitting region in the transfer region. The phase shift region includes a first phase shift region surrounding the light-transmitting region and a second phase shift region surrounding the first phase shift region. A first phase shift pattern is disposed on the light transmission substrate in the first phase shift region, and a plurality of second phase shift patterns are disposed on the light transmission substrate in the second phase shift region.
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