Etching in the presence of alternating voltage profile and resulting porous structure
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United States of America Patent
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Dec 12, 2017
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app pub date -
Jan 20, 2014
filing date -
Jan 20, 2014
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Abstract
A nanoporous metal structure is made by etching a metal alloy structure of two or more metals. Less than all of the metals are selectively removed (e.g., dissolved in solution) from the alloy in the presence of an alternating voltage profile, for example, a periodic voltage profile. The resulting nanoporous metal structure, having pore openings of about 20 nm to about 500 nm in diameter and a purity of at least about 70%, can be further treated to alter some or all of the structure, and/or to add, remove and/or modify properties thereof.
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