Reverse osmosis for purifying mixtures of hydrofluoric acid and nitric acid
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 12, 2017
Grant Date -
Apr 14, 2016
app pub date -
Apr 16, 2014
filing date -
Apr 25, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Disclosed is a method of purifying a solution containing hydrofluoric acid, nitric acid and at least one silicon impurity by treating the solution with at least one reverse osmosis membrane. According to the method of the present invention, silicon impurities contained in the solution containing hydrofluoric acid and nitric acid can be selectively removed or reduced. This method can be advantageously used in the photovoltaic industry or in the battery component industry.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully