Wafer processing method and apparatus

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United States of America Patent

PATENT NO 9837291
SERIAL NO

14163460

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Abstract

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An apparatus for and a method of bonding a first substrate and a second substrate are provided. In an embodiment a first wafer chuck has a first curved surface and a second wafer chuck has a second curved surface. A first wafer is placed on the first wafer chuck and a second wafer is placed on a second wafer chuck, such that both the first wafer and the second wafer are pre-warped prior to bonding. Once the first wafer and the second wafer have been pre-warped, the first wafer and the second wafer are bonded together.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANYNO 8 LI-HSIN RD 6 SCIENCE-BASED INDUSTRIAL PARK HSIN-CHU 300-77

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Sheng-Chau Tainan, TW 132 593
Chen, Xiaomeng Hsin-Chu, TW 121 2120
Huang, Chih-Hui Yongkang, TW 51 884
Tsai, Chia-Shiung Hsin-Chu, TW 515 6971
Tsao, Chun-Han New Taipei, TW 15 48
Tu, Yeur-Luen Taichung, TW 262 2853

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