Method for manufacturing MEMS torsional electrostatic actuator
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United States of America Patent
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Dec 5, 2017
Issued Date -
N/A
app pub date -
Jul 31, 2015
filing date -
Dec 2, 2014
priority date (Note) -
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status (Latency Note)
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Abstract
A method for manufacturing an MEMS torsional electrostatic actuator comprises: providing a substrate, wherein the substrate comprises a first silicon layer, a buried oxide layer and a second silicon layer that are laminated sequentially; patterning the first silicon layer and exposing the buried oxide layer to form a rectangular upper electrode plate separated from a peripheral region, wherein the upper electrode plate and the peripheral region are connected by only using a cantilever beam, and forming, on the peripheral region, a recessed portion exposing the buried oxide layer; patterning the second silicon layer and exposing the buried oxide layer to form a back cavity, wherein the back cavity is located in a region of the second silicon layer corresponding to the upper electrode plate, covers 40% to 60% of the area of the region corresponding to the upper electrode plate, and is close to one end of the cantilever beam; exposing the second silicon layer, and suspending the upper electrode plate and the cantilever beam; and respectively forming an upper contact electrode and a lower contact electrode on the second silicon layer.
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International Classification(s)
- 2015 Application Filing Year
- B81C Class
- 517 Applications Filed
- 370 Patents Issued To-Date
- 71.57 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- B81C Class
- 0 % this patent is cited more than
- 8 Age
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