System and method for automatic gas optimization in a two-chamber gas discharge laser system
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United States of America Patent
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Nov 28, 2017
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N/A
app pub date -
Aug 14, 2015
filing date -
Sep 10, 2014
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Abstract
A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser is disclosed. The laser is fired at low power, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased to a burst pattern that approximates the expected operation of the laser, and the amplifier chamber gas bled again if necessary until the voltage and an output energy meet or exceed minimum values, or until the pressure is less than a minimum value. The gas in the master oscillator chamber is then bled if necessary until the output energy of the master oscillator meets or falls below a maximum value, again without dropping the pressure in the chamber below the minimum value. While the pressure is adjusted, bandwidth is also measured and adjusted to stay within a desired range. Once the target values are provided, the process runs quickly without manual interaction.
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