Method for adjusting effective work function of metal gate

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United States of America Patent

PATENT NO 9831089
APP PUB NO 20160240382A1
SERIAL NO

14407210

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Abstract

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A method for adjusting an effective work function of a metal gate. The method includes forming a metal gate arrangement comprising at least a metal work function layer, and performing plasma treatment on at least one layer in the metal gate arrangement. In this way, it is possible to adjust the effective work function of the metal gate in a relatively flexible way.

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Patent Owner(s)

Patent OwnerAddress
INSTITUTE OF MICROELECTRONICS CHINESE ACADEMY OF SCIENCES100029 BEIJING CITY CHAOYANG DISTRICT BEITUCHENG WEST ROAD NO 3 BEIJING CITY BEIJING CITY 100029

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Luo, Weichun Beijing, CN 1 2
Wang, Wenwu Beijing, CN 42 208
Yan, Jiang Beijing, CN 67 1268
Yang, Hong Beijing, CN 345 2933

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