Low-moisture cloud-making cleaning article
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United States of America Patent
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Nov 28, 2017
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app pub date -
Sep 30, 2013
filing date -
Sep 30, 2013
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Abstract
A cleaning article includes a cleaning article sheet comprising a fabric substrate, wherein the fabric substrate includes pores therein, and wherein the fabric substrate has a background moisture percentage by weight, and liquid water disposed substantially and disconnectedly within the pores, wherein the liquid water is at moisture percentage by weight that is 5 to 150 percentage points higher than the background moisture percentage. The nonwoven substrate can include pores formed between and/or within the fibers and can have a background moisture percentage by weight. The substrate can include a treatment to increase the dielectric constant from the dielectric constant of the substrate without the treatment. The moisture of the article can be configured to exhibit a dielectric constant of at least 50% and up to 600% higher than the dielectric constant of the same article with only background moisture.
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