Substrate structure and the process manufacturing the same

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United States of America Patent

PATENT NO 9826632
APP PUB NO 20160219699A1
SERIAL NO

15091629

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Abstract

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A multi-layer substrate structure to achieve multiple arrangements of power/ground domains is disclosed. The multi-layer substrate structure comprises a first layer for disposing an integrated circuit thereon and a second layer coupled to the first layer, wherein a connection structure is electrically connected to a plurality of power/ground domains on the second layer. With different combinations of the sawing lines and keep-out regions on the multi-layer substrate structure for cutting off some portions of the connection structure, the invention can achieve multiple arrangements of power/ground domains without impacting the customer's PCB or system board design so as to cut short the cycle time for engineering development phase.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78
GLOBAL UNICHIP CORPNO 10 LI-HSIN 6TH ROAD HSINCHU SCIENCE PARK HSINCHU CITY 30078

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Yu-Ru Hsinchu County, TW 10 45
Chou, Ling-Chih Taipei, TW 5 10
Hsia, Yu-Fang Hsinchu, TW 2 1

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