Extreme ultraviolet light source device
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United States of America Patent
Stats
-
Nov 21, 2017
Issued Date -
N/A
app pub date -
May 22, 2015
filing date -
May 27, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An extreme ultraviolet light source device that can stably and efficiently provide EUV emission. The EUV light source device includes a first laser source that irradiates a high-temperature plasma raw material with a laser beam, and a second laser source that, after the high-temperature plasma raw material is irradiated with the laser beam and before effective extreme ultraviolet light is emitted, irradiates the raw material in that region which is irradiated with the laser beam, with a second laser beam. The EUV light source device also includes a return light blocking unit that prevents return light of the laser beam, which is emitted from the first laser source, from reaching a light emission opening of the second laser source.
First Claim
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International Classification(s)
- 2015 Application Filing Year
- H05G Class
- 239 Applications Filed
- 205 Patents Issued To-Date
- 85.78 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H05G Class
- 0 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | May 21, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 21, 2029 |
