Microcrystalline silicon thin film solar cell and the manufacturing method thereof
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United States of America Patent
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Nov 21, 2017
Issued Date -
N/A
app pub date -
Mar 11, 2015
filing date -
Oct 12, 2012
priority date (Note) -
In Force
status (Latency Note)
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Abstract
The present invention relates to a microcrystalline silicon thin film solar cell and the manufacturing method thereof, using which not only the crystallinity of a microcrystalline silicon thin film that is to be formed by the manufacturing method can be controlled and adjusted at will and the defects in the microcrystalline silicon thin film can be fixed, but also the device characteristic degradation due to chamber contamination happening in the manufacturing process, such as plasma enhanced chemical vapor deposition (PECVD), can be eliminated effectively.
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International Classification(s)
- 2015 Application Filing Year
- H01L Class
- 25498 Applications Filed
- 22451 Patents Issued To-Date
- 88.06 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- H01L Class
- 0 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | May 21, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 21, 2029 |
