Metal oxide thin film transistor

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United States of America Patent

PATENT NO 9825140
APP PUB NO 20150357475A1
SERIAL NO

14825187

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Abstract

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A metal oxide thin film transistor (TFT) includes a gate electrode, a gate insulating layer, a metal oxide active layer, a source electrode, and a drain electrode. The gate electrode is formed on a substrate. The gate insulating layer is formed on the substrate and covers the gate electrode. The metal oxide active layer is formed on the gate insulating layer. The drain electrode and the source electrode are formed on two opposite ends of the metal oxide active layer in a spaced-apart manner, in which at least one of the orthographic projection of the source electrode and the orthographic projection of the drain electrode on the substrate does not overlap the gate electrode.

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Patent Owner(s)

Patent OwnerAddress
E INK HOLDINGS INCNO 3 LI SHIN RD 1 SCIENCE-BASED INDUSTRIAL PARK HSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Tsai, Xue-Hung Hsinchu, TW 20 47
Wang, Chih-Hsuan Hsinchu, TW 15 22
Wang, Henry Hsinchu, TW 108 892
Yeh, Chia-Chun Hsinchu, TW 70 358

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