Thermal processing in silicon

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United States of America Patent

PATENT NO 9824897
APP PUB NO 20160172213A1
SERIAL NO

14905711

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Abstract

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A method is provided for the processing of a device having a crystalline silicon region containing an internal hydrogen source. The method comprises: i) applying encapsulating material to each of the front and rear surfaces of the device to form a lamination; ii) applying pressure to the lamination and heating the lamination to bond the encapsulating material to the device; and iii) cooling the device, where the heating step or cooling step or both are completed under illumination.

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Patent Owner(s)

Patent OwnerAddress
NEWSOUTH INNOVATIONS PTY LIMITEDRUPERT MYERS BUILDING GATE 14 BARKER STREET THE UNIVERSITY OF NEW SOUTH WALES SYDNEY NEW SOUTH WALES 2052 AUSTRALIA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chan, Catherine Emily Randwick, AU 12 25
Chong, Chee Mun Bellevue Hill, AU 8 15
Edwards, Matthew Bruce Elanora Heights, AU 3 5
Hallam, Brett Jason Bexley, AU 14 31
Hamer, Phillip George Kensington, AU 6 15
Lu, Pei Hsuan Rockdale, AU 22 47
Mai, Ly Sefton, AU 15 98
Song, Li Hui Kingsford, AU 2 2
Sugianto, Adeline Malabar, AU 7 33
Wenham, Alison Maree Cronulla, AU 12 34
Wenham, Stuart Ross Cronulla, AU 37 588
Xu, Guang Qi Randwick, AU 2 2

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