Plasma generation apparatus, deposition apparatus, and plasma generation method
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United States of America Patent
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Nov 21, 2017
Grant Date -
Apr 23, 2015
app pub date -
Feb 27, 2013
filing date -
Apr 12, 2012
priority date (Note) -
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Abstract
Provided is a plasma generation apparatus capable of generating uniform plasma over a wide range. The plasma generation apparatus includes two oppositely arranged plasma guns each injecting a discharge gas to be ionized, and having a cathode for emitting electrons, and a converging coil for forming a magnetic flux to guide the emitted electrons, and polarities of the converging coils with respect to the cathodes in the two plasma guns are opposite to each other.
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