Deposition method and focused ion beam system
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United States of America Patent
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Nov 21, 2017
Grant Date -
Jun 9, 2016
app pub date -
Dec 2, 2015
filing date -
Dec 3, 2014
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Abstract
A deposition method is implemented in a focused ion beam system that supplies a compound gas to a specimen, and applies an ion beam to the specimen to deposit a deposition film, the deposition method including: a first deposition film-depositing step that deposits a first deposition film on the specimen using the ion beam that is defocused with respect to the specimen; and a second deposition film-depositing step that deposits a second deposition film on the first deposition film using the ion beam that is smaller in defocus amount than that used in the first deposition film-depositing step.
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