Lithographic method

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United States of America Patent

PATENT NO 9823572
SERIAL NO

14900110

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Abstract

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A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akkermans, Johannes Antonius Gerardus Veldhoven, NL 15 65
Banine, Vadim Yevgenyevich Deurne, NL 222 2976
De, Jager Pieter Willem Herman Middelbeers, NL 85 1247
De, Vries Gosse Charles Veldhoven, NL 33 187
Donker, Rilpho Ludovicus Veldhoven, NL 8 67
Engelen, Wouter Joep Veldhoven, NL 16 88
Frijns, Olav Waldemar Vladimir Rosmalen, NL 22 174
Grimminck, Leonardus Adrianus Gerardus Veldhoven, NL 6 75
Kruizinga, Borgert Zoetermeer, NL 20 657
Litvinenko, Vladimir Veldhoven, NL 3 79
Loopstra, Erik Roelof Eindhoven, NL 325 13468
Luiten, Otger Jan Veldhoven, NL 9 53
Nienhuys, Han-Kwang Utrecht, NL 37 160
Nikipelov, Andrey Alexandrovich Eindhoven, NL 13 123

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