Transparent vapor-deposited film
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United States of America Patent
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Nov 21, 2017
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app pub date -
Sep 26, 2013
filing date -
Sep 28, 2012
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Abstract
Employed is a roller-type continuous vapor-deposited film forming device in which a film-forming section and a preprocessing section provided with a plasma preprocessing device are arranged in series at a distance from each other. With a substrate transported at a high speed, plasma (P) is supplied to the substrate surface side while set to an electrically positive potential by a plasma preprocessing means for supplying the plasma toward the substrate (S) in a space enclosed in a preprocessing roller, and enclosed in a plasma supply means for supplying a plasma-forming gas and in a magnet (21), which is a magnetism formation means. An active preprocessed surface is formed on the surface of the substrate (S). An inorganic oxide vapor-deposited film having as a principal component thereof an aluminum oxide containing AL-C covalent bonds is immediately formed at high speed in succession on the preprocessed surface of the substrate to produce a highly adhesive transparent vapor-deposited film.
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