Substrate cleaning method and recording medium
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United States of America Patent
Stats
-
Nov 14, 2017
Issued Date -
N/A
app pub date -
Jul 27, 2015
filing date -
Jul 31, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An object of the present invention is to be able to obtain a high removing performance of particles. The substrate processing method according to the exemplary embodiment comprises a film-forming treatment solution supply step and a removing solution supply step. The film-forming treatment solution supply step comprising supplying to a substrate, a film-forming treatment solution containing an organic solvent and a fluorine-containing polymer that is soluble in the organic solvent is supplied. The removing solution supply step comprises supplying to a treatment film formed by solidification or curing of the film-forming treatment solution on the substrate, a removing solution capable of removing the treatment film.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
- 1 Citation Count
- H01L Class
- 18.50 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | May 14, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 14, 2029 |
