Internal split faraday shield for a plasma source
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United States of America Patent
Stats
-
Nov 14, 2017
Issued Date -
N/A
app pub date -
Jul 7, 2014
filing date -
Oct 19, 2011
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An inductively coupled plasma source for a focused charged particle beam system includes a conductive shield within the plasma chamber in order to reduce capacitative coupling to the plasma. The internal conductive shield is maintained at substantially the same potential as the plasma source by a biasing electrode or by the plasma. The internal shield allows for a wider variety of cooling methods on the exterior of the plasma chamber.
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International Classification(s)
- 2014 Application Filing Year
- H01J Class
- 2291 Applications Filed
- 1924 Patents Issued To-Date
- 83.99 % Issued To-Date
Cited Art Landscape
Patent Citation Ranking
- 17 Citation Count
- H01J Class
- 87.58 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | May 14, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 14, 2029 |
