Mask manufacturing equipment and mask manufacturing method
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United States of America Patent
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Nov 14, 2017
Grant Date -
Sep 24, 2015
app pub date -
Mar 12, 2015
filing date -
Mar 19, 2014
priority date (Note) -
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status (Latency Note)
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Abstract
According to an embodiment, mask manufacturing equipment includes a detector, an irradiator, a calculator, and a controller. The detector detects positional deviation of a pattern formed on a mask substrate. The irradiator irradiates the mask substrate with laser light to form a heterogeneous layer that is expanded in volume in the mask substrate. The calculator calculates an area periphery irradiation condition under which the irradiator is caused to emit laser light to a peripheral area of the pattern on the basis of the positional deviation detected by the detector so that the pattern area is reduced by forming the heterogeneous layer in the peripheral area of the pattern. The controller controls the irradiator to form the heterogeneous layer in the peripheral area of the pattern according to the area periphery irradiation condition.
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