Extreme ultraviolet (EUV) pod having marks
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 14, 2017
Issued Date -
N/A
app pub date -
Sep 23, 2015
filing date -
Sep 24, 2014
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present invention relates to an EUV pod having marks, which comprises a mask pod and one or more mark disposed on the mask pod. One or more sensor of a processing machine is used for detecting the one or more mark. By including the one or more mark, the surface roughness of one or more region of the mask pod detectable by the one or more sensor can be altered. The one or more sensor emits light to the mask pod, which reflects the light to the one or more sensor. The one or more sensor receives the reflection light from the mask pod and judges if the voltage generated by the reflection light falls within the reflection ranges of the mark. Thereby, whether the one or more sensor corresponds to the one or more make can be confirmed.
First Claim
Other Claims data not available
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
- 0 Citation Count
- G03F Class
- 0 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | May 14, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 14, 2029 |
