Plasma spectrometry method

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United States of America Patent

PATENT NO 9816933
SERIAL NO

14627586

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A plasma spectrometry method with high reproducibility of plasma light emission is described, wherein the method comprises: a detection step of applying a voltage, thereby detecting the resulting plasma light emission; and non-detection step of detecting no plasma light emission.

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Patent Owner(s)

Patent OwnerAddress
ARKRAY INC57 NISHIAKETA-CHO HIGASHIKUJO MINAMI-KU KYOTO-SHI KYOTO 601-8045

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kudo, Akitsugu Kyoto, JP 6 3
Shiraki, Yasunori Kyoto, JP 31 479
Tanaka, Takashige Kyoto, JP 14 65

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