Method of producing structure containing phase-separated structure
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United States of America Patent
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Nov 14, 2017
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Oct 22, 2014
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Oct 25, 2013
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Abstract
A method of forming a structure containing a phase-separated structure, the method including applying a block copolymer solution to a substrate to form a layer containing a block copolymer and having a film thickness of less than 100 nm; and phase-separating the layer containing the block copolymer, a solvent of the block copolymer solution comprising a poor solvent exhibiting a poor solubility for a homopolymer A of one of the blocks of the block copolymer.
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