Treating solution for electronic parts, and process for producing electronic parts
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United States of America Patent
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Nov 7, 2017
Issued Date -
Oct 1, 2015
app pub date -
Mar 27, 2015
filing date -
Mar 29, 2014
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Abstract
The invention provides an aqueous solution capable of selectively protecting a nitrogen-containing silicon compound from corrosion by a treating solution for etching, cleaning or the like, etching oxygen-containing, carbon-containing silicon in particular, and making a large etch rate difference between a nitrogen-containing silicon compound and an oxygen-containing silicon compound, and a process for producing electronic parts as well.
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