Microwave chemical processing
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United States of America Patent
Stats
-
Nov 7, 2017
Issued Date -
N/A
app pub date -
Nov 15, 2016
filing date -
Nov 15, 2016
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Methods and systems include supplying pulsed microwave radiation through a waveguide, where the microwave radiation propagates in a direction along the waveguide. A pressure within the waveguide is at least 0.1 atmosphere. A supply gas is provided at a first location along a length of the waveguide, a majority of the supply gas flowing in the direction of the microwave radiation propagation. A plasma is generated in the supply gas, and a process gas is added into the waveguide at a second location downstream from the first location. A majority of the process gas flows in the direction of the microwave propagation at a rate greater than 5 slm. An average energy of the plasma is controlled to convert the process gas into separated components, by controlling at least one of a pulsing frequency of the pulsed microwave radiation, and a duty cycle of the pulsed microwave radiation.
First Claim
Other Claims data not available
Family
International Classification(s)
- H01J:ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- C01B:NON-METALLIC ELEMENTS; COMPOUNDS THEREOF
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- B82Y:SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; ....
- H05H:PLASMA TECHNIQUE
- H01H:ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PR....
Cited Art Landscape
Patent Citation Ranking
- 13 Citation Count
- H01J Class
- 87.58 % this patent is cited more than
- 8 Age
Maintenance Fees
| Fee | Large entity fee | small entity fee | micro entity fee | due date |
|---|---|---|---|---|
| 7.5 Year Payment | $3600.00 | $1800.00 | $900.00 | May 7, 2025 |
| 11.5 Year Payment | $7400.00 | $3700.00 | $1850.00 | May 7, 2029 |