Composition for forming overlay film, and resist pattern formation method employing the same
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United States of America Patent
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Nov 7, 2017
Issued Date -
Nov 19, 2015
app pub date -
Dec 12, 2013
filing date -
Dec 13, 2012
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Abstract
The objective of this invention is to provide a composition for forming a topcoat layer enabling to produce a pattern excellent in roughness and in pattern shape; and also to provide a pattern formation method employing that composition is described. The means for solving this objective is a composition for forming a topcoat layer, comprising a solvent and a fullerene derivative having a hydrophilic group; and also a method of forming a pattern by casting the above composition on a resist surface and then by subjecting it to exposure and development.
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