Memory element with a reactive metal layer

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United States of America Patent

PATENT NO 9806130
SERIAL NO

15393545

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Abstract

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A re-writeable non-volatile memory device including a re-writeable non-volatile two-terminal memory element (ME) having tantalum. The ME including a first terminal, a second terminal, a first layer of a conductive metal oxide (CMO), and a second layer in direct contact with the first layer. The second layer and the first layer being operative to store at least one-bit of data as a plurality of resistive states, and the first and second layer are electrically in series with each other and with the first and second terminals.

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Patent Owner(s)

Patent OwnerAddress
HEFEI RELIANCE MEMORY LIMITEDHEFEI

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chevallier, Christophe J Palo Alto, US 246 8058
Hsia, Steve Kuo-Ren San Jose, US 37 1780
Kinney, Wayne Emmett, US 100 3920
Longcor, Steven Mountain View, US 15 145
Rinerson, Darrell Cupertino, US 110 5317
Sanchez, John Palo Alto, US 68 1159
Swab, Philip F S Santa Rosa, US 11 136
Ward, Edmond R Monte Sereno, US 48 2175

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