Plasma processing apparatus
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United States of America Patent
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Oct 31, 2017
Grant Date -
May 7, 2015
app pub date -
Nov 3, 2014
filing date -
Nov 5, 2013
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Abstract
In a plasma processing apparatus, target values for feedback control to be applied to a progressive wave power PF as control parameters, i.e., control instruction values Con and Coff are switched during a pulse-on period Ton and a pulse-off period Toff in each cycle of a modulation pulse, respectively. That is, a first feedback control for making the progressive wave power PF approximate to a first control instruction value Con is performed during the pulse-on period Ton, whereas a second feedback control for making the progressive wave power PF approximate to a second control instruction value Coff is performed during the pulse-off period Toff.
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